UNICORN-620N Series ★Received 1st place in Quality Award from TSMC in 2016★ ◎ Features: Applicable to Mask Inspections for 28 nm – 5 nm nodes. SMIF POD does not have to be turned on when inspecting, so there are no secondary pollution concerns. Real time dust monitoring for Blank / ADI / AEI process at Mask Shop. Real time dust monitoring on the Backside / Blank of EUV Mask. High-precision defect location inspection. ◎ Application: Processing inspections at Mask Shops. For Mask Blank Manufacturers.