UNICORN-620N Series
★Received 1st place in Quality Award from TSMC in 2016★
◎ Features：
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Applicable to Mask Inspections for 28 nm – 5 nm nodes.
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SMIF POD does not have to be turned on when inspecting, so there are no secondary pollution concerns.
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Real time dust monitoring for Blank / ADI / AEI process at Mask Shop.
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Real time dust monitoring on the Backside / Blank of EUV Mask.
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High-precision defect location inspection.
◎ Application：
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Processing inspections at Mask Shops.
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For Mask Blank Manufacturers.
