UNICORN-640 Series

◎ Features:

  • Applicable to EUV Mask inspections.

  • Particle inspection for Pattern Side and Pellicle Side.

  • Uses dedicated algorithm to analyze Particle on / under Pellicle.

  • High-precision defect location inspection.

◎ Application:

  • EUV Mask OQC at Mask Shops.

  • For Pellicle Manufacturers.