UNICORN-640 Series

★Received Equipment Quality Award from TSMC in 2014★

◎ Features:

  • Applicable to Mask Inspections for 45 nm – 7 nm nodes.
  • Pin-Hole inspection.
  • Particle inspection for Inner Frame and Pellicle Side.
  • Uses dedicated algorithm to analyze Particle on / under Pellicle.
  • High-precision defect location inspection.

◎ Application

  • OQC at Mask Shops.
  • For Pellicle Manufacturers.