UNICORN-640 Series
★Received Equipment Quality Award from TSMC in 2014★
◎ Features：
Applicable to Mask Inspections for 45 nm – 7 nm nodes.
Pin-Hole inspection.
Particle inspection for Inner Frame and Pellicle Side.
Uses dedicated algorithm to analyze Particle on / under Pellicle.
High-precision defect location inspection.
◎ Application：
OQC at Mask Shops.
For Pellicle Manufacturers.
