UNICORN-640E Pro Series

◎ Features:

  • Applicable to EUV Mask inspections.
  • Particle inspection for Pattern Side and Pellicle Side.
  • Uses dedicated algorithm to analyze Particle on / under Pellicle.
  • High-precision defect location inspection.

◎ Application:

  • EUV Mask OQC at Mask Shops.
  • For Pellicle Manufacturers.