UNICORN-640E Pro Series
◎ Features：
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Applicable to EUV Mask inspections.
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Particle inspection for Pattern Side and Pellicle Side.
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Uses dedicated algorithm to analyze Particle on / under Pellicle.
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High-precision defect location inspection.
◎ Application：
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EUV Mask OQC at Mask Shops.
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For Pellicle Manufacturers.
