◎ 2020

  • Launched the first generation Defect Classification System.
  • Launched the second generation EUV Pellicle Inspection Tool.

◎ 2019

  • Expanded our R & D center.
  • Launched the third generation Through POD Mask Inspection Tool.
  • Launched the third generation OQC Mask Inspection Tool.
  • Launched the second generation EUV Mask Inspection Tool.
  • Started the development of measurement technology in Optical CD Measure.
  • Started the development of AI classification technology in Defect Classification.

◎ 2018

  • Launched the first generation EUV Pellicle Inspection Tool.
  • Launched the first generation EUV Mask Inspection Tool.
  • Started the development of Optical Mask inspection technology applicable to Foundries.

◎ 2017

  • Launched the second generation Through POD Mask Inspection Tool.
  • Obtained 3 invention patents.
  • Started the development and application of EUV Mask and EUV Pellicle inspection technology.

◎ 2016

  • Launched the second generation OQC Mask Inspection Tool.
  • Obtained 6 utility model patents.

◎ 2015

  • Launched the first generation Through POD Mask Inspection Tool.
  • Started the application of Through POD Mask inspection technology.

◎ 2014

  • Started the development of Through POD Mask inspection technology.
  • Launched the first generation OQC Mask Inspection Tool.
  • Started the development and application of Optical Mask inspection technology applicable to Mask Shops.

◎ 2012

  • Obtained 1 utility model patent.

◎ 2011

  • Expanded into AceMach Co., Ltd.

◎ 2003

  • Established AceMach Ltd.