◎ 2019

  • Expanded our R & D center.

  • Launched the third generation Through POD Mask Inspection Tool.

  • Launched the third generation OQC Mask Inspection Tool.

  • Launched the second generation EUV Mask Inspection Tool.

  • Started the development of measurement technology in Optical CD Measure.

  • Started the development of AI classification technology in Defect Classification.

◎ 2018

  • Launched the first generation EUV Pellicle Inspection Tool.

  • Launched the first generation EUV Mask Inspection Tool.

  • Started the development of Optical Mask inspection technology applicable to Foundries.

◎ 2017

  • Launched the second generation Through POD Mask Inspection Tool.

  • Started the development and application of EUV Mask and EUV Pellicle inspection technology.

◎ 2016

  • Launched the second generation OQC Mask Inspection Tool.

◎ 2015

  • Launched the first generation Through POD Mask Inspection Tool.

  • Started the application of Through POD Mask inspection technology.

◎ 2014

  • Started the development of Through POD Mask inspection technology.

  • Launched the first generation OQC Mask Inspection Tool.

  • Started the development and application of Optical Mask inspection technology applicable to Mask Shops.

◎ 2011

  • Established AceMach Co., Ltd.